Vacuum Science and Thin Film Deposition Seminar

Morning:

Vacuum Science and System Design

This session will introduce the basic concepts in vacuum technology and how they apply to system design and operation. Subjects covered include molecular density in vacuum, the ideal gas law, molecular flow in vacuum pressure regimes, characteristics of gas composition at various molecular densities, general principles of gas-solid interactions, vacuum pump technology, pressure sensors, leak detection, and the impact of fundamental design decisions and operating practices on vacuum system performance.

Afternoon:

Physical Vapor Deposition and Thin Film Growth Models

This session will introduce the fundamental concepts and operating principles for the deposition of thin films by thermal and e-beam evaporation as well as direct current magnetron sputtering (dcMS), pulsed dcMS, radio frequency magnetron sputtering (RfMS), and high impulse power magnetron sputtering (HIPMs) techniques. Correlation between process parameters, such as deposition rate, and film properties, including electrical resistivity and reflectivity, is discussed. Several models for thin film growth are presented with reference to how specific material properties, including film/substrate interactions, and deposition conditions may affect thin film structures.

Info: This introductory session establishes the foundational principles of Vacuum Science, covering pressure ranges, system definitions, and the practical applications of vacuum technology. It provides a technical deep dive into gas physics, exploring atmospheric composition, basic gas laws, and the complex interactions between gases, solids, and flow regimes. By the end of the hour, trainees will understand the fundamental mechanics of how gas behaves as it is removed from a controlled environment.

Info: This session transitions from theory to practical engineering, focusing on how to optimize and measure the performance of a vacuum system. It explores the relationship between gas conductance and pumping speed, teaching how hardware configuration directly impacts the efficiency of high-vacuum pumps. Additionally, the training covers compact system design and the methods used to characterize a system's performance to ensure it meets operational requirements.

Info: This section covers the critical hardware and diagnostics required to maintain and monitor system integrity. It focuses on pressure measurement and Residual Gas Analysis (RGA) for gas identification, alongside the mechanical standards for seals, flanges, and surface finishes. The hour concludes with practical strategies for managing pressure differentials and the essential techniques for leak detection.

Info: We will discuss the methods to quantify leaks and a general approach to detection will be presented. In addition, specific techniques to detect leaks in rough, medium, high, and ultra-high vacuum will be detailed.

Info: Here we address the maintenance of pristine vacuum environments through specialized cleaning protocols and the analytical tests used to verify cleanliness. It also introduces the modeling of vacuum systems, teaching trainees how to use computational tools to predict performance and simulate system behavior before physical assembly.

Info: This module introduces the principles of Thin Film Deposition, focusing on the fundamental processes used to apply precise material coatings. It provides a technical breakdown of thermal evaporation techniques and explores the geometric and physical variables that influence thickness uniformity across a substrate.

Info: This module explores advanced Physical Vapor Deposition (PVD) techniques, specifically comparing electron beam evaporation with various methods of magnetron sputtering (DC, pDC, and RF). It details the mechanics of sputter yields and target utilization, while examining how reactive sputtering is used to create specific compound films.

Info: This module examines high-performance deposition technologies, specifically focusing on the high-density plasma physics of High Power Impulse Magnetron Sputtering (HiPIMS). It covers the engineering of various sputter cathode designs and provides an introduction to Atomic Layer Deposition (ALD) for achieving precise, layer-by-layer film growth with exceptional conformality.

Info: Several models for thin film growth are presented with reference to how specific materials properties, including film/substrate interactions, and deposition conditions may affect thin film structures.

Event Venue & Nearby Stays

Singh Center for Nanotechnology, Glandt Forum, Philadelphia, United States

Concerts, fests, parties, meetups - all the happenings, one place.

Get App