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This presentation will highlight two focused applications of photoelectron spectroscopy that address current challenges in surface and materials analysis.PART1: Cryogenic X ray Photoelectron Spectroscopy (cryo XPS)
For the stabilisation and characterisation of reactive, mobile, or beam sensitive surfaces. By cooling samples under ultra high vacuum, cryo XPS enables the preservation of volatile species, metastable chemical states, and liquid or semi liquid interfaces that would otherwise be altered during conventional analysis. Examples will be presented demonstrating how cryogenic stabilisation improves chemical state fidelity, suppresses radiation damage, and enables the study of hydrated, polymeric, and energy related sensitive surfaces.
PART2: Organic semiconductor materials
Their analysis using a combined XPS and Ultraviolet Photoelectron Spectroscopy (UPS). XPS is used to identify elemental composition, chemical states, and interfacial chemistry, while UPS provides direct insight into valence electronic structure, work function, and energy level alignment. Together, these techniques offer a powerful methodology for understanding charge transport, interfacial energetics, and device relevant surface chemistry in organic electronics. Case studies will illustrate how photoelectron spectroscopy supports the development and optimisation of organic semiconductors for applications such as OLEDs, photovoltaics, and thin film transistors.
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Event Venue
Rm G25, Science Centre North Block, The Chinese University of Hong Kong, 90 Nathan Rd, Tsim Sha Tsui, Kowloon, Hong Kong SAR, Hong Kong, Hong Kong
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